Welcome Message

You are cordially invited to the 10th International Conference on Spectroscopic Ellipsometry, ICSE-10, to be held 08-13 June 2025 at the University of Colorado, Boulder, Colorado. 

The ICSE Conferences are the premier gatherings of experts and non-experts alike to share knowledge and learn about the latest advances and applications of spectroscopic ellipsometry and related techniques.  The meeting consists of a wide variety of tutorials, invited talks, presentations, and posters that cover all aspects of the field, and provides ample opportunities for networking and discussion.  The equipment display will cover the latest not only in ellipsometry but also in other methods of learning about surfaces, interfaces, thin films, nanostructures, and bulk materials under both static and dynamic conditions through the use of polarized light.

The meeting will be held on the campus of the University of Colorado at Boulder.  The campus is in the foothills of the Rocky Mountains, and is about an hour away from the Denver Airport by public transportation.  Boulder is known for its blend of urban and outdoor activities, including a vibrant downtown and talented brewers and chefs.  The pedestrian Pearl Street Mall includes numerous art galleries, cafes, restaurants, and boutiques.  In addition to spectacular scenery, Boulder provides a wealth of recreational opportunities including biking and hiking.  The Rocky Mountain National Park is about 1 ½ hours away.

Organizing Committee

Mathias Schubert

(Program Chair)

University of Nebraska-Lincoln (USA) & Lund University (Sweden)

David E. Aspnes

(Honorary Chair)

North Carolina State University (USA)

Alain C. Diebold

(Advisory Chair)

CNSE, University at Albany, SUNY (USA)

Eva Schubert

(Workforce & Sponsoring Chair)

University of Nebraska-Lincoln (USA)

Markus Raschke

(Local Chair)

University of Colorado at Boulder (USA)

Attendance Support

ICSE-10 has made available a flat-rate attendance support by discounting student registration and by allocating low-budget housing in Campus Lodging. Attendance Support is thankfully made possible by our Diamond Sponsors.

Scope & Topics

The comprehensive Technical Program will include a broad range of aspects in the field of ellipsometry and polarimetry, as well as related applications utilizing the polarization properties of light as a diagnostic of surfaces, interfaces, thin films, nanostructures, and bulk materials.

Topics cover theory, instrumentation, and applications across physics, chemistry, material science, and life sciences, as well as engineering and metrology.

Theory

  • Artificial Intelligence and Machine Learning
  • Data Analysis
  • Fast data processing
  • Optical Modeling (Finite Element, ab-initio, …)
  • Subwavelength Structure Analysis and Modeling
  • Time-dependence

Instrumentation

  • Imaging Ellipsometry and High-Resolution
  • Metrology
  • Mueller-Matrix Spectroscopy
  • New Developments
  • Nonlinear and Time-Resolved Ellipsometry
  • THz and Extreme Ultraviolet

Applications

  • Advanced Semiconductor Metrology
  • Anisotropy and Anisotropic Materials
  • Artificial Intelligence and Machine Learning
  • Bio- and Life-Sciences
  • Correlated Systems
  • Chemistry and Biochemistry
  • Ferroelectrics, Piezoelectrics, Ferromagnetics, Antiferromagnetics, Multiferroics
  • High-Entropy Materials
  • Imaging
  • Interfaces
  • Liquid Crystals
  • Mueller-Matrix Polarimetry and Scatterometry
  • Nanomaterials
  • Optical Properties
  • Organics and Polymers
  • Photovoltaics and Renewable Energy Materials
  • Quantum Materials and Materials for Quantum Applications
  • Real-time Process Monitoring and Control
  • Two-Dimensional Systems

From Monday, June 9, through Friday, June 13, 2025, Oral and Poster Sessions will take place in the Glenn Miller Ballroom, including an excellent lineup of Keynote & Invited Speakers.
Please find the up-to-date Schedule of Events in the Abstract Book.

Keynote Speakers

University of Colorado Boulder (USA)

In-Situ Spectroscopic Ellipsometry Studies of Selective Atomic Layer Deposition and Etch Processes

University at Albany, SUNY (USA)

Mueller-Matrix Spectroscopic Ellipsometry based Scatterometry: Optical Dimensional and Shape Analysis

Huazhong University of Science and Technology (China)

Advanced Mueller-Matrix Ellipsometry: Instrumentation and Emerging Applications

Lund University (Sweden) 

THz Spectroscopic Ellipsometry and Its Future

New Mexico State University (USA)

Accurate Measurements of Optical Constants using Temperature-Dependent Ellipsometry and Comparison with k.p Theory

Yuxiang Zheng

Fudan University (China)

Half a Century of Spectroscopic Ellipsometry in China

ONTO Innovation (USA)

Have Polarizer – Will Travel: The Need for Ellipsometry Expertise in Industry

SEMI Foundation (USA)

Workforce Development for Semiconductor Industry

Invited Speakers

David Aspnes

North Carolina State University (USA)

Removing Noise from Spectra: The Next 100 Years.

Hans A. Bechtel

Lawrence Berkeley National Laboratory (USA)

Ultrabroadband infrared nanospectroscopy: From Near to Far

Shirly Espinoza

ELI Beamlines (Czech Republic)

Approaching Ultrafast Phenomena in Materials by Time-Resolved Ellipsometry

Thomas A. Germer

National Institute of Standards and Technology (USA)

EUV spectroscopic ellipsometry and scatterometry

Kurt Hingerl

Johannes Kepler University Linz (Austria)

Applied Spectroscopic Imaging Ellipsometry

Hiroyuki Fujiwara

Gifu University (Japan)

Highly Accurate Classification of Material Types from Spectroscopic Ellipsometry Heatmap Measurements Using Deep Learning

Ufuk Kilic

University of Nebraska-Lincoln (USA)

Metamaterial Platforms: Harnessing Spectrally Controllable Strong Chiroptical Activity and Beyond

Taeyong Jo

Samsung (South Korea)

New Spectroscopic Ellipsometry Instrumentation for Application to the Semiconductor Industry

Peter Petrik

University of Debrecen (Hungary)

Low-Dimensional, Combinatorial and Periodic Structures for Sensing Catalysis – Characterization of Interface Process by In-Situ Spectroscopic Ellipsometry

Angelo Pierangelo

Institut Polytechnique De Paris (France)

Fast, High-Resolution Integrated Multispectral Mueller Ellipsometry for In-Vivo Biomedical Diagnostics

Viktor Rindert

Lund University (Sweden)

Exploring Paramagnetic Resonance through Mueller-Matrix Ellipsometry

Chris Sturm

Universität Leipzig (Germany)

Electromagnetic Waves in Optically Anisotropic Media: Presence and Propagation of Singular States

Tutorials

On Sunday, June 8, 2025, complimentary Tutorials will kick-off ICSE-10 with outstanding scientists teaching introductory and advanced aspects in emerging areas.

CNRS, École Polytechnique (France)

Imaging Mueller Polarimetry: From Metrology to Biomedicine

University of Nebraska-Lincoln (USA) & Lund University (Sweden)

The Eigenpolarization Model: A physics approach to render the susceptibility tensors of anisotropic materials

The University of Toledo (USA)

Data Analysis:  Turning Bad Models into Good Results

Eindhoven University of Technology (The Netherlands)

In-Situ Spectroscopic Ellipsometry during Atomic Layer Deposition and Related Processes

Florida International University (USA)

Artificial Intelligence and Machine Learning in Ellipsometry

Workforce Development

ICSE-10 will dedicate a special session to aspects of Workforce Development for early-career professionals and students alike.

ONTO Innovation (USA)

Have Polarizer – Will Travel: The Need for Ellipsometry Expertise in Industry

SEMI Foundation (USA)

Workforce Development for Semiconductor Industry

Awards

On Friday, June 13, 2025, the Awards ceremony will recognize excellent achievements at different levels by honoring

  • with the Hans Mueller Memorial Award and Lecture, shared in equal halves:
    Prof. Dr. John A. Woollam, Founder and CEO of J.A. Woollam Co., Inc. and Professor of Electrical and Computer Engineering at the University of Nebaska-Lincoln (USA), for having made pioneering, life-long contributions to the development, application, dissemination, and education in the field of spectroscopic ellipsometry; and
    Prof. Dr. David E. Aspnes, Distinguished University Professor Emeritus of Physics at North Carolina State University (USA), for development of fundamental theories of the linear and nonlinear optical properties of materials and thin films, and for pioneering the field of spectroscopic ellipsometry.
  • with the Paul Drude Award:
    Dr. Ufuk Kiliç, Research Associate Professor at the University of Nebraska-Lincoln (USA), for the achievement of having demonstrated and determined unambiguous structural and optical relationships for chiral and achiral nanostructured metamaterials using computational engineering, nanostructure material preparation, and spectroscopic ellipsometry.
  • with the Innovation and Creativity Award:
    Dr. Shirly Espinoza, Scientist at ELI Beamlines. The Extreme Light Infrastructure ERIC. Dolní Břežany (Czech Republic), for developing the first versatile UV-NIR femtosecond pump-probe spectroscopic ellipsometer and for training, educating, and leading a broad and diverse international user community.
  • with Student Awards for best oral presentations and for best posters:
    Undergraduate and graduate students to be determined based on evaluations during the conference.

Industry Exhibition

From Monday, June 9, through Thursday, June 12, 2025, ICSE-10 will feature a simultaneous Industry Exhibition. The exhibition will be located in the Aspen Rooms next to the Glenn Miller Ballroom at the main conference venue.